This chapter reviews the different tin oxide nanostructures grown by chemical vapor deposition (CVD). The chapter is divided into six major sections. The first section is an introduction; presents the general concepts of the nanomaterials and in particular, the tin oxide nanostructures. The second section, a brief historical review of the CVD followed by the description of the processes, systems, and equipment involved in the CVD will provide the key elements to understand the CVD technology. The variants of the CVD process that allow obtaining tin oxide nanostructures will be presented in the third section. The CVD process is usually carried out with different setups or procedures, this section reviews some of those techniques and their advantages or drawbacks. In the fourth section the different growth mechanisms are discussed. Although we will focus on Vapor-Liquid-Solid (VLS) and Vapor-Solid (VS) mechanisms, that are the most widely proposed to the formation of one-dimensional (1D) nanostructure (nanowires, nanoneedles, and nanorods), other mechanisms as Solution-Liquid-Solid (SLS) or Vapor-Solid-Solid (VSS) are also considered. The fifth section has identified and described the potential applications of the tin oxide nanostructures grown by CVD. A representative number of applications in the fields of electronics, optics, optoelectronics, fuel cells, and sensing devices have been listed. The last section presents a global vision of the future outlook in the tin oxide nanostructure synthesis by CVD.
Isabel Sayago, Esther Hontañón, Manuel Aleixandre
Tin Oxide Materials 1st Edition Synthesis, Properties, and Applications, cap. 9, pp. 247-280. Marcelo Ornaghi Orlandi, Elsevier, 2019